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Design for Manufacturability with Advanced Lithography

Produktform: E-Buch Text Elektronisches Buch in proprietärem

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.weiterlesen

Elektronisches Format: PDF

Sprache(n): Englisch

ISBN: 978-3-319-20385-0 / 978-3319203850 / 9783319203850

Verlag: Springer International Publishing

Erscheinungsdatum: 28.10.2015

Seiten: 164

Autor(en): Bei Yu, David Z Pan, David Z. Pan

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